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Fabrication and properties of Nb/Al, Al sub ox /Nb Josephson tunnel junctions with a double-oxide barrier

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345579· OSTI ID:6961988
; ; ;  [1]
  1. University of Twente, Faculty of Applied Physics, P.O.B. 217, 7500 AE Enschede, The Netherlands (NL)

High-quality Nb/Al, Al{sub ox}/Nb Josephson tunnel junctions using double-oxide layers as barriers have been fabricated. The critical current density is controlled by the thickness of the second Al layer. This layer has to be oxidized completely through in order to obtain high-quality junctions. Typically, gap voltages of 2.8--3.0 mV and {ital V}{sub {ital m}} up to 70 mV at 4.2 K were obtained.

OSTI ID:
6961988
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:4; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English