(Concepts for future developments in electron microscopy). [Concept for Future Development in Electron Microscopy]

Technical Report · Mon Apr 30 04:00:00 EDT 1990

DOI:https://doi.org/10.2172/6959950· OSTI ID:6959950

Allard, L F; Nolan, T A

At the request of Hitachi, Ltd. and JEOL, Ltd. and primarily at their expense, the travelers visited the JEOL factory and the Hitachi Central Research Laboratory in Tokyo, and the Hitachi Naka Works Factory in Katsuta. At these three facilities the travelers presented seminars explaining both ORNL's significance in materials research and electron microscopy and concepts relating to transmission electron microscopy resolution improvements, instruments and concepts that the manufacturers are developing. Additionally, they had the opportunity to assess the performance of the recently introduced Hitachi 200-kV Field Emission Gun TEM. The visit provided the travelers a unique opportunity to influence the directions for future instrumental developments by two major electron microscope manufacturers.

• Research Organization: Oak Ridge National Lab., TN (USA)
• Sponsoring Organization: DOE/CE
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6959950
• Report Number(s): ORNL/FTR-3589; ON: DE90010630
• Country of Publication: United States
• Language: English

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AMORPHOUS STATE
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AUTOMATION
CRYSTAL STRUCTURE
DESIGN
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