(Development and evaluation of new instrumentation in field-emission electron microscopy)

Technical Report · Wed May 08 04:00:00 EDT 1991

OSTI ID:5858700

Allard, L F; Nolan, T A

The travelers visited the JEOL factory in Tokyo, the Hitachi Advanced Research Laboratory in Hatoyama, and the Hitachi Naka Works in Katsuta, Japan. Prior to the Japan portion of the trip, the travelers presented invited seminars at the Agency for Defense Development laboratories in Taejeon, Korea. These seminars described ceramics research in the US and at ORNL, the nature of the User Program at the HTML, and the use of high-resolution electron microscopy in the characterization of ceramic materials. At the JEOL factory, the travelers assessed the performance of the prototype of the 200-kV FEG TEM soon to be introduced by JEOL, and received details of JEOL's current developmental efforts in electron holography. The visit to the new Advanced Research Laboratory, recently opened by Hitachi, permitted the travelers to discuss the optics of the Hitachi FEG instrument with experts at that facility and to receive demonstrations on experimental techniques in electron holography. A day at the Hitachi Naka Works permitted the travelers to make specific measurements on other competitive instruments so that the most appropriate instrument can be chosen for future purchase.

• Research Organization: Oak Ridge National Lab., TN (USA)
• Sponsoring Organization: DOE; USDOE, Washington, DC (USA)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 5858700
• Report Number(s): ORNL/FTR-3902; ON: DE91012212
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360200 -- Ceramics
Cermets
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440800* -- Miscellaneous Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ASIA
CERAMICS
CHALCOGENIDES
COATINGS
ELECTRON MICROSCOPES
ELECTRON MICROSCOPY
ELEMENTS
IRON
JAPAN
METALS
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MICROSCOPY
OXIDES
OXYGEN COMPOUNDS
SEMIMETALS
SILICON
TRANSITION ELEMENTS
TRAVEL