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Crystalline growth of wurtzite GaN on (111) GaAs

Conference ·
OSTI ID:6959725
;  [1];  [2]
  1. California Univ., Berkeley, CA (United States). Dept. of Electrical Engineering and Computer Sciences
  2. Lawrence Berkeley Lab., CA (United States)
Gallium Nitride films were grown on (111) gallium arsenide substrates using reactive rf magnetron sputtering. Despite a 20% lattice mismatch and different crystal structure, wurtzite. Heteroepitaxy was observed for growth temperatures between 550-600{degrees}C. X-ray diffraction patterns revealed (0002) GaN peak with a full-width-half-maximum (FWHM) as narrow as 0.17{degree}. Possible surface reconstructions to explain the epitaxial growth are presented.
Research Organization:
Lawrence Berkeley Lab., CA (United States)
Sponsoring Organization:
DOE; NSF; USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6959725
Report Number(s):
LBL-32258; CONF-911202--85; ON: DE92041165; CNN: 1-442427-21482
Country of Publication:
United States
Language:
English