Solar-induced chemical vapor deposition of diamond-type carbon films

Patent · 13 September 1994

OSTI ID:6954543

Pitts, J R; Tracy, C E; King, D E; Stanley, J T

An improved chemical vapor deposition method for depositing transparent continuous coatings of sp[sup 3]-bonded diamond-type carbon films, comprises: (a) providing a volatile hydrocarbon gas/H[sub 2] reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and (b) directing a concentrated solar flux of from about 40 to about 60 watts/cm[sup 2] through said reactant mixture to produce substrate temperatures of about 750 C to about 950 C to activate deposition of the film on said substrate. 11 figs.

• DOE Contract Number: AC02-83CH10093
• Assignee: Midwest Research Inst., Kansas City, MO (United States)
• Patent Number(s): A; US 5346729
• Application Number: PPN: US 8-062840
• OSTI ID: 6954543
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
140905*
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
CARBON
CHEMICAL COATING
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
DIAMONDS
ELEMENTAL MINERALS
ELEMENTS
ENERGY
FILMS
HEAT
HEATING
MINERALS
NONMETALS
PROCESS HEAT
SOLAR HEATING
SOLAR PROCESS HEAT
SURFACE COATING
THIN FILMS