Materials processing of diamond: Etching, doping by ion implantation, and contact formation. Annual technical report, 1 October 1988-30 September 1989

Technical Report · Sat Sep 30 00:00:00 EDT 1989

OSTI ID:6952031

Swanson, M L

We are studying implantation doping, etching, contact formation, and regrowth of natural diamond, for future applications to the fabrication of devices from thin film CVD diamond. In addition, we are characterizing thin film diamonds of other ONR contractors, using iron beam methods. In diamond, implantation doping is difficult because the high annealing temperature necessary to remove damage and to obtain efficient dopant activation often causes graphitization. We have used an innovative co-implantation of C plus the desired dopant at 77 K, followed by rapid thermal annealing (RTA) or furnace annealing, to overcome this problem. The removal of surface layers of diamond by polishing or chemical etching is hampered by its extreme hardness and chemical inertness. We have demonstrated that reactive ion etching with O is an effective method of removing controlled amounts of diamond. We have developed a new sputtering method of forming strong metallic contacts to diamond at ambient temperatures, which may prove invaluable for microelectronics and heat sink applications. Factors affecting epitaxial regrowth of damaged natural diamond are crucial for both ion beam doping and CVD growth. We have successfully regrown C-ion implanted natural diamond layers by RTA or furnace anneals.

• Research Organization: North Carolina Univ., Chapel Hill, NC (USA). Dept. of Physics and Astronomy
• OSTI ID: 6952031
• Report Number(s): AD-A-216530/6/XAB
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
DIAMONDS
ETCHING
ION IMPLANTATION
ANNEALING
CHEMICAL VAPOR DEPOSITION
CRYSTAL DOPING
EPITAXY
FURNACES
GRAPHITE
HARDNESS
HEAT SINKS
HIGH TEMPERATURE
ION BEAMS
IRON
LAYERS
MATERIALS
MICROELECTRONICS
PROCESSING
PROGRESS REPORT
SPUTTERING
SURFACES
THERMAL RADIATION
THIN FILMS
BEAMS
CARBON
CHEMICAL COATING
DEPOSITION
DOCUMENT TYPES
ELECTROMAGNETIC RADIATION
ELEMENTAL MINERALS
ELEMENTS
FILMS
HEAT TREATMENTS
MECHANICAL PROPERTIES
METALS
MINERALS
NONMETALS
RADIATIONS
SINKS
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENTS
360605* - Materials- Radiation Effects
656003 - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)