Comparative study of low-pressure rare-gas fluoride/chloride lasers excited by a short-pulse electron beam
Output characteristics of the short-pulse electron-beam excited ArF (193 nm), KrF (248 nm), XeF (351 nm), KrCl (222 nm), and XeCl (308 nm) lasers were experimentally investigated at the same time on the same device for various mixtures all pumped at a high excitation rate of 2.3 MW/cm/sup 3/. The optimum pressure of rare gas forming its rare-gas halide excimer increased for the sequence of ArF, KrCl, KrF, XeCl, and XeF, indicating that rare-gas halides were more quenched by the heavier rare gases, such as Xe, even at near-atmospheric pressures. At nearly atmospheric pressures the Ar-buffered mixtures gave higher laser energy than Ne-buffered mixtures except for the XeF laser. Through a series of measurements, the ArF laser showed the best result on the output energy of 96 J (5 J/l-script ) with an intrinsic efficiency of 3.4%.
- Research Organization:
- Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1, Hiyoshi, Kohoku-ku, Yokohama 223, Japan
- OSTI ID:
- 6949458
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:4; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
420300* -- Engineering-- Lasers-- (-1989)
ARGON COMPOUNDS
ARGON FLUORIDES
CHLORIDES
CHLORINE COMPOUNDS
COMPARATIVE EVALUATIONS
DATA
EFFICIENCY
ENERGY
EXCIMER LASERS
EXPERIMENTAL DATA
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
HALIDES
HALOGEN COMPOUNDS
INFORMATION
KRYPTON CHLORIDES
KRYPTON COMPOUNDS
KRYPTON FLUORIDES
LASERS
NUMERICAL DATA
OPTIMIZATION
PERFORMANCE
PUMPING
RARE GAS COMPOUNDS
XENON CHLORIDES
XENON COMPOUNDS
XENON FLUORIDES