Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Stimulated emission from ArF(, KrCl(, KrF(, XeCl(, and XeF( molecules excited by a fast discharge

Journal Article · · Sov. J. Quant. Electron. (Engl. Transl.); (United States)

An investigation was made of the energy, time, and spectral dependences of stimulated emission from the molecules of ArF( (lambdaroughly-equal193 nm), KrCl( (222 nm), KrF( (248 nm), XeCl( (308 nm), and XeF( (351 nm). The radiation energy per pulse was up to 0.27 J and the average power was 0.56 W.

Research Organization:
Institute of Power Electronics, Siberian Branch, Academy of Sciences of the USSR, Tomsk
OSTI ID:
6322322
Journal Information:
Sov. J. Quant. Electron. (Engl. Transl.); (United States), Journal Name: Sov. J. Quant. Electron. (Engl. Transl.); (United States) Vol. 11:2; ISSN SJQEA
Country of Publication:
United States
Language:
English

Similar Records

High-power gas-discharge excimer ArF, KrCl, KrF and XeCl lasers utilising two-component gas mixtures without a buffer gas
Journal Article · Thu Mar 31 00:00:00 EDT 2016 · Quantum Electronics (Woodbury, N.Y.) · OSTI ID:22551083

Comparative study of low-pressure rare-gas fluoride/chloride lasers excited by a short-pulse electron beam
Journal Article · Mon Aug 15 00:00:00 EDT 1988 · J. Appl. Phys.; (United States) · OSTI ID:6949458

Excimer ultraviolet gas-discharge XeF, XeCl, and KrF lasers
Journal Article · Fri Dec 31 23:00:00 EST 1976 · Sov. J. Quant. Electron. (Engl. Transl.); (United States) · OSTI ID:7310050