Generation of tunable short pulse VUV radiation by four-wave mixing in xenon with femtosecond KrF-excimer laser pulses

Journal Article · Thu Apr 01 00:00:00 EST 1993 · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/3.214511· OSTI ID:6436544

Tuennermann, A; Momma, C; Mossavi, K; Windolph, C; Wellegehausen, B ^[1]

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1. Univ. Hanover (Germany)

A four-wave difference-frequency mixing scheme based on near resonant two-photon excitation of xenon with a femtosecond KrF-excimer laser system is used to generate tunable short pulse radiation in the VUV and UV spectral range between 133 and 355 nm with output energies of several [mu]J by applying tunable nanosecond laser radiation in the range of 1,905 nm to 185 nm. At the excimer wavelengths of 193 nm (ArF), 308 nm (XeCl) and 351 nm (XeF), the process has been used to generate high power short pulse radiation by double-pass amplification in an additional excimer laser discharge. So far, output energies of 1.9, 3.0, and 2.8 mJ, respectively, have been obtained at pulse durations in the range of 1 ps. Non-linear susceptibilities for the difference-frequency mixing process were calculated from a stationary susceptibility formalism and compared to experimental values.

• OSTI ID: 6436544
• Journal Information: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States), Vol. 29:4; ISSN 0018-9197
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
KRYPTON FLUORIDE LASERS
ULTRAVIOLET RADIATION
EXCIMER LASERS
EXPERIMENTAL DATA
FREQUENCY MIXING
LASER RADIATION
PULSES
TUNING
XENON
DATA
ELECTROMAGNETIC RADIATION
ELEMENTS
FLUIDS
GAS LASERS
GASES
INFORMATION
LASERS
NONMETALS
NUMERICAL DATA
RADIATIONS
RARE GASES
426002* - Engineering- Lasers & Masers- (1990-)