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Title: Oriented growth of Y sub 1 Ba sub 2 Cu sub 3 O sub x thin films by dual ion beam sputtering

Conference · · AIP Conference Proceedings (American Institute of Physics); (USA)
OSTI ID:6949186
; ; ;  [1]
  1. IBM Research Division, T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598 (USA)

We report the deposition of crystalline as-deposited ion beam sputtered Y{sub 1}Ba{sub 2}Cu{sub 3}O{sub {ital x}} thin films with orientations of (100), (001), and (110)/(103) and a method for controlling the orientation of the films. Films deposited on Al{sub 2}O{sub 3} Yttria (9%) stabilized ZrO{sub 2} typically have a near random orientation, while the films on MgO show a high degree of orientation. In addition, post deposition heat treatments at 500 C were found to reduce the room temperature resisitivity significantly, although no superconducting material, maintaining a specular surface. RBS analysis shows a variation in the composition as a function of substrate position on the platen, which indicates a re-sputtering mechanism due to highly energetic neutrals from the target surface.

OSTI ID:
6949186
Report Number(s):
CONF-881035-; CODEN: APCPC; TRN: 90-017257
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (USA), Vol. 182:1; Conference: Topical conference on high- Tc superconducting thin films, devices, and characterization, Atlanta, GA (USA), 3 Oct 1988; ISSN 0094-243X
Country of Publication:
United States
Language:
English

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