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Effect of deposition rate on properties of YBa sub 2 Cu sub 3 O sub 7 minus. delta. superconducting thin films

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103209· OSTI ID:6948973
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  1. Exploratory Research, Los Alamos National Laboratory, Los alamos, New Mexico 87545 (USA) Development Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (USA)

Superconducting thin films of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} on (100) SrTiO{sub 3} are prepared {ital in} {ital situ} by a pulsed laser deposition technique at deposition rates from 1 to 145 A/s. Crystallinity of the films is examined by Rutherford backscattering in the channeling mode using a 2.2 MeV He{sup +} ion beam. The backscattering minimum yield ({chi}{sub min}) increases with the deposition rate. A {chi}{sub min} of 3% is observed in the films deposited at the lowest deposition rate. Even at a deposition rate of 145 A/s, the films show good crystallinity with {chi}{sub min} of 15%, indicating epitaxial growth. The x-ray diffraction measurements show that the films have strong {ital c}-axis orientation normal to the substrates. The films have metallic resistance versus temperature behavior with zero resistance temperatures of 90 K. The results indicate that the pulsed laser deposition technique could be used to deposit large-area films efficiently with adequate substrate movement.

OSTI ID:
6948973
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:15; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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