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Crystallinity of a -axis oriented YBa sub 2 Cu sub 3 O sub 7 minus. delta. thin film epitaxially grown on NdGaO sub 3 (110) by 95 MHz magnetron sputtering

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.105316· OSTI ID:5342497
; ; ; ; ;  [1]; ;  [2]
  1. Superconductivity Research Laboratory, ISTEC, 13-10 Shinonome 1 chome, Koto-ku, Tokyo 135 (Japan)
  2. Department of Nuclear Engineering, Hokkaido University, 8-West 13-North, Kita-ku, Sapporo 060 (Japan)

An {ital a}-axis oriented 400 A YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} film has been epitaxially deposited on a NdGaO{sub 3} (110) substrate by rf magnetron sputtering using a single YBa{sub 2}Cu{sub 5}O{sub {ital x}} target. An excitation frequency of 94.92 MHz, seven times as high as the conventionally used 13.56 MHz, results in a lower self-bias voltage which reduces degradation of films caused by resputtering due to negatively charged oxygen. Sharp streaks corresponding to the {ital c}-axis lattice parameter of YBa{sub 2}Cu{sub 3}O{sub 7{minus}{delta}} have been observed by reflection high-energy electron diffraction, showing that the {ital c}-axis is parallel to the surface of the NdGaO{sub 3} substrate and the film surface is smooth on an atomic scale. The crystallinity has been characterized by Rutherford backscattering channeling analysis. A minimum yield, {chi}{sub min} of 3.2%, has confirmed excellent crystallinity of the {ital a}-axis oriented film.

OSTI ID:
5342497
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 59:11; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English