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Structural studies of argon-sputtered amorphous carbon films by means of extended x-ray-absorption fine structure

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)

The temperature-dependent microscopic structure of plasma-deposited a-C:H and magnetron-sputtered a-C films, in situ sputter cleaned by argon bombardment, has been investigated by near-edge (NEXAFS) and extended (EXAFS) x-ray-absorption fine-structure studies. We find that the microscopic structure of the two films becomes indistinguishable after sputtering with a loss of hydrogen for the a-C:H sample. The structure of the sputtered films at 30 /sup 0/C is characterized by a first-neighbor C-C bond length of 1.445(10) A. Upon annealing the bond length approaches that of graphite (1.421 A) with a value of 1.427(10) A at 1050 /sup 0/C, the highest annealing temperature used. Analysis of the EXAFS amplitude of the first-neighbor shell leads to a two-phase structural model consisting of a ''graphitelike'' network and a statically and dynamically disordered ''random matrix.'' The fraction of carbon atoms in the ''graphitelike'' network increases from 60(6)% at 30/sup 0/C to 92(9)% at 1050/sup 0/C. Analysis of the higher-neighbor-shell EXAFS signals leads to a model for the ''graphitelike'' regions, consisting of a network of conjugated odd- and even-membered rings, without long-range order. In contrast, the ''random matrix'' is suggested to be a mostly chainlike network of double and single bonds. Our results suggest that the ''graphitelike'' matrix is a precursor state for crystallization.

Research Organization:
IBM Research Division, Almaden Research Center, San Jose, California 95120-6099
OSTI ID:
6932361
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 38:11; ISSN PRBMD
Country of Publication:
United States
Language:
English