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Rapid chemical vapor deposition of superconducting YBa sub 2 Cu sub 3 O sub x

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103330· OSTI ID:6926432
; ; ; ; ; ; ; ; ; ;  [1]; ;  [2]
  1. Georgia Institute of Technology, Atlanta, Georgia 30332 (USA)
  2. American Magnetics, Inc., Oak Ridge, Tennessee 37831-2509 (USA)

A process has been developed that enables the rapid chemical vapor deposition of superconducting YBa{sub 2}Cu{sub 3}O{sub {ital x}}. In this process a finely ground mixture of Y(tmhd){sub 3}, Ba(tmhd){sub 2}, and Cu(tmhd){sub 2} (tmhd=2,2,6,6-tetramethyl-3,5-heptanedionate) is slowly fed, and pneumatically transported, directly into the chemical vapor deposition furnace. Because vaporizers are not used, the number of process parameters that must be controlled is greatly reduced. Deposition rates are at least an order of magnitude greater than those achieved by reagent sublimation. Films have been characterized by scanning electron microscopy, energy dispersive x-ray spectroscopy, x-ray diffraction, and resistance versus temperature measurements. Films produced on planar MgO substrates have {ital T}{sub {ital c}} values that are significantly higher than previously reported for MgO.

OSTI ID:
6926432
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:12; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English