Low-temperature atmospheric pressure chemical vapor deposition of titanium disulfide films

Journal Article · · Chemistry of Materials; (United States)

DOI:https://doi.org/10.1021/cm00024a007· OSTI ID:6925636

Winter, C H; Lewkebandara, T S ^[1]; Proscia, J W ^[2]

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1. Wayne State Univ., Detroit, MI (United States)
2. Ford Motor Co., Dearborn, MI (United States)

A new atmospheric vapor deposition process for TiS[sub 2] films was developed; it relies upon the reaction of Ti tetrachloride with organothiols at temperatures as low as 200[degree]C, yielding TiS[sub 2] coatings with crystallographic orientation well suited for use as cathodes in Li batteries. The adhesion, surface finish and density of these films are superior to those obtained using H[sub 2] as the source of S. The material has a low C content, implying an efficient carbon-sulfur cleavage. The reflectivity of the films is consistently high. At 300[degree]C the density of the film is 2.81 g/cm[sup 3], or 87% of the bulk density of TiS[sup 2].

• OSTI ID: 6925636
• Journal Information: Chemistry of Materials; (United States), Journal Name: Chemistry of Materials; (United States) Vol. 4:6; ISSN CMATEX; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
360606 -- Other Materials-- Physical Properties-- (1992-)
ADHESION
BULK DENSITY
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COHERENT SCATTERING
DENSITY
DEPOSITION
DIFFRACTION
ELASTIC SCATTERING
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
REFLECTIVITY
RUTHERFORD SCATTERING
SCATTERING
SULFIDES
SULFUR COMPOUNDS
SURFACE COATING
SURFACE PROPERTIES
TITANIUM COMPOUNDS
TITANIUM SULFIDES
TRANSITION ELEMENT COMPOUNDS
X-RAY DIFFRACTION