Coordination chemistry of titanium tetrachloride with organosulfur compounds: Relevance to the chemical vapor deposition of titanium disulfide films
- Wayne State Univ., Detroit, MI (United States)
Titanium disulfide possesses the CdI{sub 2} layered structure and has important applications as a cathode material in lithium batteries and as a solid lubricant. We have previously reported that the gas phase reaction of titanium tetrachloride with alkylthiols affords titanium disulfide films at {>=}200{degrees}C. In order to further understand the CVD process, we have carried out a detailed study of the solution coordination chemistry of titanium tetrachloride with organosulfur compounds. Treatment of titanium tetrachloride with thiols (RSH) and sulfides (R{sub 2}S) affords adducts of the formula [TiCl{sub 4}(RSR`){sub 2}] (R`=H, alkyl), while disulfides (R{sub 2}S{sub 2}) afford adducts of the formula [TiCl{sub 4}]{sub 2}(RSSR). The adduct [TiCl{sub 4}(HStBu){sub 2}], unlike the others, is unstable at ambient temperature and decomposes to chloride thiolates. The insoluble chloride thiolate [TiCl{sub 3}(StBu)]n is the major product (ca. 50% isolated yield). Its chemistry will be overviewed. Evidence will be presented that [TiCl{sub 3}(StBu)]n plays an important role along the path to titanium disulfide.
- OSTI ID:
- 214917
- Report Number(s):
- CONF-950801--
- Country of Publication:
- United States
- Language:
- English
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