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High resolution Z-contrast imaging and lattice location analysis of dopants in ion-implanted silicon

Journal Article · · Mater. Res. Soc. Symp. Proc.; (United States)
OSTI ID:6922596
Two new electron microscopy techniques have been developed which greatly extend the capabilities for the micro-characterization of semiconductors. The first is a technique for the direct imaging of dopants in semiconductors, whether or not they are in solution, using Z-contrast, and the second is a technique for determining the substantial fraction of dopant. Both techniques are capable of nanometer spatial resolution and allow the detailed study of dopant segregation, precipitation, and clustering effects. 8 references, 8 figures.
Research Organization:
Oak Ridge National Lab., TN
DOE Contract Number:
AC05-84OR21400
OSTI ID:
6922596
Journal Information:
Mater. Res. Soc. Symp. Proc.; (United States), Journal Name: Mater. Res. Soc. Symp. Proc.; (United States) Vol. 41; ISSN MRSPD
Country of Publication:
United States
Language:
English