Heating stage for [ital in] [ital situ] studies of thin-film reactions

Journal Article · Sat May 01 04:00:00 EDT 1993 · Review of Scientific Instruments; (United States)

DOI:https://doi.org/10.1063/1.1144082· OSTI ID:6884695

Schwarz, R B; Rubin, J B ^[1]

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1. Center for Materials Science, Los Alamos National Laboratory, MS K-765, Los Alamos, New Mexico 87545 (United States)

We describe a method for measuring and controlling the temperature of thin ceramic plates which are used as substrates for the deposition of thin films in high vacuum. The ceramic plates have an embedded platinum resistor which acts as both heating element and thermometer. The temperature of the substrate is controlled by an electronic feedback circuit. This arrangement enables accurate measurements of the thin-film temperature. In addition, the system has a fast response time and excellent long-term temperature stability. We describe an application where the temperature control system is combined with ac resistance measurements to study the kinetics of a solid-state interdiffusion reaction in Ni-Zr multilayers.

• OSTI ID: 6884695
• Journal Information: Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 64:5; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104 -- Metals & Alloys-- Physical Properties
440800* -- Miscellaneous Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
ALLOYS
ATOM TRANSPORT
CERAMICS
CHEMICAL REACTION KINETICS
CONTROL
DIFFUSION
ELECTRICAL EQUIPMENT
EQUIPMENT
FILMS
KINETICS
LASL
NATIONAL ORGANIZATIONS
NEUTRAL-PARTICLE TRANSPORT
NICKEL ALLOYS
RADIATION TRANSPORT
REACTION KINETICS
RESISTORS
TEMPERATURE CONTROL
THIN FILMS
US AEC
US DOE
US ERDA
US ORGANIZATIONS
ZIRCONIUM ALLOYS