Deep etch x-ray lithography at the advanced light source: First results

Journal Article · Mon Oct 31 23:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)

DOI:https://doi.org/10.1116/1.587420· OSTI ID:6847377

Malek, C K; Jackson, K ^[1]; Brennen, R A; Hecht, M H ^[2]; Bonivert, W D; Hruby, J ^[3]

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1. Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)
2. Center for Space Microelectronics, Jet Propulsion Laboratory, Pasadena, California 91109 (United States)
3. Materials Synthesis Department, Sandia National Laboratories, Livermore, California 94551 (United States)

Deep etch x-ray lithography permits the manufacture of very accurate high-aspect-ratio microstructures, which can be used as master templates for subsequent replication by electroforming and/or molding processes. This allows for mass production of three-dimensional microstructures in a variety of materials. In this article we report on the first results using x rays from the Advanced Light Source (ALS) at the Lawrence Berkeley Laboratory, as well as on the processing and technology developed to produce high-aspect-ratio microstructures. The first masks used were simple stencil masks chemically or laser etched in thick metal sheets. For resist, we used commercial acrylic cast sheets. Microstructures 840 [mu]m thick were fabricated by deep x-ray lithography and used as templates for copper electroforming. A technology for the high contrast masks required to work at these short wavelengths is being developed and a deep etch x-ray lithography facility is under construction at the ALS.

• OSTI ID: 6847377
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 12:6; ISSN JVTBD9; ISSN 0734-211X
• Country of Publication: United States
• Language: English

Related Subjects

665000* -- Physics of Condensed Matter-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ACRYLATES
ADVANCED LIGHT SOURCE
ASPECT RATIO
BREMSSTRAHLUNG
CARBOXYLIC ACID SALTS
ELECTROMAGNETIC RADIATION
ETCHING
IONIZING RADIATIONS
RADIATION SOURCES
RADIATIONS
SURFACE FINISHING
SYNCHROTRON RADIATION
SYNCHROTRON RADIATION SOURCES
USES
X RADIATION