Implantation studies of hydrogen by field ion microscopy and spectroscopy: Final report
The depth resolution of the Field Ion Microscope/Imaging Atom Probe (FIM/IAP) is of the order of a crystal d-spacing of the metal under investigations. The current study involved the application if the FIM/IAP to the study of low energy ions (<20 keV) implanted into metals to obtain depth profiles. Two ion species of immense technological importance were used, nitrogen and deuterium. Results of this investigation fall into four categories: (1) instrumentation development, (2) development of new experimental techniques, (3) the generation and interpretation of experimental data and (4) the determination of a number of characteristics of FIM which can influence the interpretation of experimental observations.
- Research Organization:
- Florida Univ., Gainesville (USA). Dept. of Materials Science and Engineering
- DOE Contract Number:
- FG05-84ER45172
- OSTI ID:
- 6843385
- Report Number(s):
- DOE/ER/45172-T1; ON: DE88015806
- Country of Publication:
- United States
- Language:
- English
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