Implantation studies of hydrogen by field ion microscopy and spectroscopy: Final report
For both fundamental and applied research in Materials Science there is widespread interest in ion implantation. This is particularly true in the field of tribology where the study of surface wear during sliding contact is especially important. The depth resolution of the Field Ion Microscope/Imaging Atom Probe (FIM/IAP) is of the order of a crystal d-spacing of the metal under investigation. The current study involves the application of the FIM/IAP to the study of low energy ions (<20 keV) implanted into nickel and tungsten to obtain depth profiles. Two ion species of immense technological importance were used, nitrogen and deuterium. Results of this investigation fall into four categories: 1) Instrumentation development. 2) Development of new experimental techniques, 3) The generation and interpretation of Experimental Data and 4) The determination of a number of characteristics of FIM which can influence the interpretation of experimental observations. 106 refs., 58 figs., 3 tabs.
- Research Organization:
- Florida Univ., Gainesville (USA). Dept. of Materials Science and Engineering
- DOE Contract Number:
- FG05-84ER45172
- OSTI ID:
- 6810795
- Report Number(s):
- DOE/ER/45172-T2; ON: DE88016020
- Country of Publication:
- United States
- Language:
- English
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75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
C CODES
CHARGED PARTICLES
COMPUTER CODES
CRYSTAL DEFECTS
CRYSTAL STRUCTURE
D CODES
DEUTERIUM IONS
DIFFUSION
DOCUMENT TYPES
ELEMENTS
EMBRITTLEMENT
EQUATIONS
F CODES
I CODES
ION IMPLANTATION
ION MICROSCOPY
IONS
METALS
MICROSCOPY
MICROSTRUCTURE
NICKEL
NITROGEN IONS
P CODES
PHYSICAL RADIATION EFFECTS
PROGRESS REPORT
RADIATION EFFECTS
SPECTROSCOPY
T CODES
TRANSITION ELEMENTS
TUNGSTEN