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Implantation studies of hydrogen by field ion microscopy and spectroscopy: Final report

Technical Report ·
OSTI ID:6810795

For both fundamental and applied research in Materials Science there is widespread interest in ion implantation. This is particularly true in the field of tribology where the study of surface wear during sliding contact is especially important. The depth resolution of the Field Ion Microscope/Imaging Atom Probe (FIM/IAP) is of the order of a crystal d-spacing of the metal under investigation. The current study involves the application of the FIM/IAP to the study of low energy ions (<20 keV) implanted into nickel and tungsten to obtain depth profiles. Two ion species of immense technological importance were used, nitrogen and deuterium. Results of this investigation fall into four categories: 1) Instrumentation development. 2) Development of new experimental techniques, 3) The generation and interpretation of Experimental Data and 4) The determination of a number of characteristics of FIM which can influence the interpretation of experimental observations. 106 refs., 58 figs., 3 tabs.

Research Organization:
Florida Univ., Gainesville (USA). Dept. of Materials Science and Engineering
DOE Contract Number:
FG05-84ER45172
OSTI ID:
6810795
Report Number(s):
DOE/ER/45172-T2; ON: DE88016020
Country of Publication:
United States
Language:
English