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RF sputter deposition of Y-Ba-Cu-O superconducting thin films from an oxide powder target

Conference · · AIP Conf. Proc.; (United States)
OSTI ID:6843145
Thin films of Y-Ba-Cu-O have been fabricated using rf diode sputtering from a single mixed-oxide powder target. The target consisted of about 200 grams of mixed reacted CuO, BaCO/sub 3/, and Y/sub 2/O/sub 3/ powders spread over an 8-inch Cu plate, and mounted horizontally in a standard-model sputtering system. Such a target was used for repeated rf-diode depositions in a ''sputter-up'' mode to a substrate hanging face-down, with deposition rate of order 50--100 A/minute. Substrates investigated include sapphire and yttria- stabilized zirconia. Well-cooled substrates yielded films close to the composition of an YBa/sub 2/Cu/sub 3/O/sub 7/ target. In contrast, uncooled or heated substrates yielded films dramatically deficient in Cu relative to the target. Sputtering for several hours in Ar plasma with 10% O/sub 2/ yielded shiny, black films approx. =1 ..mu..m thick. Subsequent processing of films on zirconia substrates up to 850 /sup 0/C in pure O/sub 2/ yielded an onset of superconductivity at approx. =87 K, with a broad transition to zero resistance at approx. =50 K. Improvements in this transition are expected as process parameters are refined. Effects of varying substrate temperature, rf power, target composition, and post-deposition annealing treatment will be discussed.
Research Organization:
CVC Products, Inc., Rochester, NY 14603
OSTI ID:
6843145
Report Number(s):
CONF-871178-
Conference Information:
Journal Name: AIP Conf. Proc.; (United States) Journal Volume: 165:1
Country of Publication:
United States
Language:
English

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