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Low-loss GaAs optical waveguides formed by lateral epitaxial growth over oxide

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.92352· OSTI ID:6830594

We report the successful demonstration of a new type of single-mode semiconductor waveguide, an oxide-confined optical waveguide, that has lower loss and should have a smaller allowable bend radius than previously reported structures. The waveguides are formed by a new technique of lateral epitaxial growth of single-crystal GaAs over an SiO/sub 2/ film. Rib waveguides formed on these epitaxial layers have SiO/sub 2/ as the lower confining layer and thus have better confinement than comparable all-semiconductor structures. Losses of only 2.3 dB/cm (0.54 cm/sup -1/) have been measured at 1.06 ..mu..m.

Research Organization:
Massachusetts Inst. of Tech., Lexington
OSTI ID:
6830594
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 38:5; ISSN APPLA
Country of Publication:
United States
Language:
English

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