Method and apparatus for increasing the durability and yield of thin film photovoltaic devices
This patent describes a method of manufacturing thin film photovoltaic cells including the steps of depositing at least first and second thin film semiconductor layers on a substrate and forming electrical contacts to the semiconductor layers. The improvement described here comprises applying a reverse bias voltage between the semiconductor layers, laser scanning the cell to selectively locate localized shorting or shunting defects therein whereby material from one of the cell components on one side of one of the thin film semiconductor layers would thereby contact a cell component on the other side at that semiconductor layer through the defect which would result in a short or shunt, and selectively thermally eliminating the defect to prevent such shorting.
- Assignee:
- University of Delaware, Newark, DE
- Patent Number(s):
- US 4640002
- OSTI ID:
- 6819264
- Country of Publication:
- United States
- Language:
- English
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Method and apparatus for increasing the durability and yield of thin film photovoltaic devices
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Related Subjects
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
DEFECTS
DIRECT ENERGY CONVERTERS
ELECTRIC POTENTIAL
ELECTRONIC EQUIPMENT
ELONGATION
EQUIPMENT
FASTENERS
FILMS
LASERS
LAYERS
MACHINE PARTS
MANUFACTURING
MATERIALS
OPTICAL EQUIPMENT
OPTICAL SCANNERS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
POSITIONING
SEMICONDUCTOR MATERIALS
SERVICE LIFE
SHAFTS
SLEEVES
THIN FILMS