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Formation of In sub x Ga sub 1 minus x As/GaAs heteroepitaxial layers using a pulsed laser driven rapid melt-solidification process

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.103065· OSTI ID:6815192
; ;  [1];  [2];  [3]
  1. Solid State Laboratory, Stanford University, Stanford, CA (USA) Department of Electrical Engineering, Stanford University, Stanford, California 94305 (USA)
  2. Center for Materials Research, Stanford University, Stanford, California 94305 (USA)
  3. Lawrence Livermore National Laboratory, Livermore, California 94550 (USA)
Heteroepitaxial In{sub {ital x}}Ga{sub 1{minus}{ital x}}As/GaAs structures have been formed for the first time by pulsed laser induced mixing of molecular beam epitaxy deposited In films ({similar to}200 A) on GaAs (100) substrates. The process occurs by a melt-induced, rapid-mixing and solidification process driven by a XeCl pulsed excimer laser. The laser has a 27 ns full width at half maximum pulse width at 308 nm with its energy density of 0.28--0.61 J cm{sup {minus}2} homogenized into a 4{times}4 mm square area which is stepped across the wafer. In{sub {ital x}}Ga{sub 1{minus}{ital x}}As layers with {ital x} values, as determined by both x-ray diffraction and Rutherford backscattering spectrometry simulation ranging from {ital x}=0.21--0.26 and thicknesses of 77--94 nm, have been formed. The formation of single-crystal layers has been verified by {sup 4}He ion channeling and cross-section transmission electron microscopy.
OSTI ID:
6815192
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 56:19; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English