Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Correlation between solid-state reaction and electrical properties of the Rh/GaAs Schottky contact

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.338205· OSTI ID:6809798
The solid-state reactions between (100) GaAs substrates and Rh films --150 A and --600 A thick, annealed at temperatures between 300 and 800 /sup 0/C, are investigated with conventional and heavy ion Rutherford backscattering spectrometry, and x-ray diffraction. Initiation of interface reactions between the Rh films and the GaAs substrate is observed at --300 /sup 0/C. Laterally segregated RhGa, RhAs, and RhAs/sub 2/ phases are detected for the 150-A Rh/GaAs contact annealed in the temperature range of 300--700 /sup 0/C. For thick Rh film (--600 A) on GaAs, vertical phase separation between the RhGa and the Rh-As phases is observed after annealing. After annealing at 700 /sup 0/C for 20 min, the reaction between the 600-A Rh film and GaAs is complete and a layer sequence of RhGa/RhAs/sub 2//GaAs results. Electrical properties of Rh/n-GaAs diodes are measured using the current voltage dependence. A correlation between the electrical behavior and the metallurgical reaction is observed.
Research Organization:
Center for Advanced Materials, Lawrence Berkeley Laboratory and University of California, Berkeley, California 94720
DOE Contract Number:
AC03-76SF00098
OSTI ID:
6809798
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 61:3; ISSN JAPIA
Country of Publication:
United States
Language:
English