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Preparation of CuInSe/sub 2/ films by reactive co-sputtering

Conference · · Proc. - Electrochem. Soc.; (United States)
OSTI ID:6803564

CuInSe/sub 2/ coatings have been deposited onto glass and alumina substrates by co-sputtering from Cu and In planar magnetron sputtering sources in an Ar and H/sub 2/Se working gas. The coating structure and composition were controlled by the substrate temperature and the relative sputtering fluxes from the two sources. Single phase chalcopyrite coatings with a high degree of 112 preferred orientation were obtained at substrate temperatures in the 350/sup 0/C to 450/sup 0/C range. The formation of near-stoichiometric coatings appears to be aided at elevated temperatures by an evaporation mechanism which removes excess In from the growing coating.

Research Organization:
Telic Company, Santa Monica, CA
OSTI ID:
6803564
Report Number(s):
CONF-8305161-
Journal Information:
Proc. - Electrochem. Soc.; (United States), Journal Name: Proc. - Electrochem. Soc.; (United States) Vol. 83-11; ISSN PESOD
Country of Publication:
United States
Language:
English