Ion-bombardment-enhanced plasma etching of tungsten with NF/sub 3//O/sub 2/
Ions and neutrals sampled from a NF/sub 3//O/sub 2/ etching plasma were observed by a quadrupole mass spectrometer and cylindrical mirror ion energy analyzer to investigate ion-bombardment-enhanced etching of tungsten. Dc biasing of a 13.56 MHz, 2.7 Pa, 1.24 W/cm/sup 2/ , 3/1 NF/sub 3//O/sub 2/ glow discharge raised the average ion energy bombarding the grounded electrode from 35 to 172 eV concurrent with an increase in the ion current by a factor of 3. Total conversion of NF/sub 3/ to N/sub 2/ and F/sub 2/ occurred under these conditions yielding a typical etch rate of polycrystalline tungsten of 150 nm/min. The primary ion observed was WF/sup +//sub 5/. The WF/sub 6/ etch product concentration was independent of ion energy, but correlated strongly with ion current. The results support a damage-induced chemical reaction as the enhancement mechanism.
- Research Organization:
- Department of Chemical Engineering, University of California, Berkeley, California 94720
- OSTI ID:
- 6791137
- Journal Information:
- J. Vac. Sci. Technol., B; (United States), Journal Name: J. Vac. Sci. Technol., B; (United States) Vol. 6:5; ISSN JVTBD
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360101 -- Metals & Alloys-- Preparation & Fabrication
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHARGED PARTICLES
COLLISIONS
ELECTRIC DISCHARGES
ELECTRODES
ELEMENTS
ETCHING
FLUORIDES
FLUORINE COMPOUNDS
GLOW DISCHARGES
HALIDES
HALOGEN COMPOUNDS
ION COLLISIONS
IONS
METALS
MOLECULAR IONS
MOLECULE COLLISIONS
PHYSICAL RADIATION EFFECTS
RADIATION EFFECTS
REFRACTORY METAL COMPOUNDS
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN COMPOUNDS
TUNGSTEN FLUORIDES