Etching of tungsten with XeF/sub 2/: An x-ray photoelectron spectroscopy study
In situ x-ray photoelectron spectroscopy measurements of both W(100) crystals and sputter-deposited tungsten films exposed to a molecular beam of XeF/sub 2/ with and without an accompanying argon ion beam have yielded the fluorine coverage and the chemical states of the adsorbed fluorine as a function of temperature, exposure, and ion dose. WF, WF/sub 2/, WF/sub 3/, and WF/sub 4/ were found to exist on the tungsten surfaces. Room and elevated temperature exposures of clean tungsten resulted in the surface population of mainly WF species with WF/sub 4/ observed on nonannealed samples. Ion dose promoted the formation of higher fluorine coordination species from the WF leading to the formation of volatile WF/sub 6/ and thus resulting in ion-enhanced etching of tungsten.
- Research Organization:
- Department of Physics, University of Houston, Houston, Texas 77004
- OSTI ID:
- 6000348
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 62:11; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360101 -- Metals & Alloys-- Preparation & Fabrication
656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ADSORPTION
COLLISIONS
ELECTRON SPECTROSCOPY
ELECTRONIC STRUCTURE
ELEMENTS
ETCHING
FLUORIDES
FLUORINE
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HALOGENS
METALS
MOLECULE COLLISIONS
NONMETALS
PHOTOELECTRON SPECTROSCOPY
RARE GAS COMPOUNDS
REFRACTORY METAL COMPOUNDS
SORPTION
SORPTIVE PROPERTIES
SPECTROSCOPY
SPUTTERING
SURFACE FINISHING
SURFACE PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN
TUNGSTEN COMPOUNDS
TUNGSTEN FLUORIDES
XENON COMPOUNDS
XENON FLUORIDES