Reactive sticking coefficients of silane on silicon
Conference
·
· AIP Conf. Proc.; (United States)
OSTI ID:6780931
Reactive sticking coefficients (RSCs) were measured for silane and disilane on polycrystalline silicon for a wide range of temperature and flux (pressure) conditions. The data were obtained from deposition rate measurements using molecular beam scattering and a very low pressure cold wall reactor. The RSCs have non-Arrhenius temperature dependences and decreases with increasing flux at low (710/sup 0/) temperatures. A simple model involving dissociative adsorption of silane is consistent with these results. The results are compared with previous studies of the SiH/sub 4//Si(s) reaction.
- Research Organization:
- Sandia National Laboratories, Albuquerque, NM 87185-5800
- OSTI ID:
- 6780931
- Report Number(s):
- CONF-8711124-
- Conference Information:
- Journal Name: AIP Conf. Proc.; (United States) Journal Volume: 167:1
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
ADSORPTION
BEAMS
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELEMENTS
HYDRIDES
HYDROGEN COMPOUNDS
KINETICS
MOLECULAR BEAMS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
REACTION KINETICS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SORPTION
SORPTIVE PROPERTIES
SURFACE COATING
SURFACE PROPERTIES
360601* -- Other Materials-- Preparation & Manufacture
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400201 -- Chemical & Physicochemical Properties
ADSORPTION
BEAMS
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELEMENTS
HYDRIDES
HYDROGEN COMPOUNDS
KINETICS
MOLECULAR BEAMS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
REACTION KINETICS
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SORPTION
SORPTIVE PROPERTIES
SURFACE COATING
SURFACE PROPERTIES