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Electron attachment and ionization processes in CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, and n-C/sub 4/F/sub 10/

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:6772289

Measurements are reported of the electron attachment (eta/sub T//N) and ionization (..cap alpha../sub T//N) coefficients for the perfluoroalkanes n-C/sub N/F/sub 2//sub N//sub +2/ (N = 1 to 4) over the density-reduced electric field (E/N) range 5 x 10/sup -17/less than or equal toE/Nless than or equal to400 x 10/sup -17/ V cm/sup 2/ using pulsed Townsend (PT) experimental techniques. The present eta/sub T//N measurements are the first to be obtained for pure C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, and n-C/sub 4/F/sub 10/ at low E/N values. The eta/sub T//N measurements in C/sub 3/F/sub 8/ and n-C/sub 4/F/sub 10/ are dependent on gas pressure over a wide E/N range in agreement with previous high pressure electron attachment rate constant k/sub a/ measurements in these gases. The dissociative and nondissociative electron attachment processes for C/sub 3/F/sub 8/ and n-C/sub 4/F/sub 10/ have been quantified from the pressure dependence of the measured electron attachment coefficients eta/sub T//N as a function of E/N. The thermal electron attachment rate constants (k/sub a/)/sub th/ and the high voltage limiting electric field strengths (E/N)/sub lim/ obtained from the present measurements are in good agreement with previous literature values.

Research Organization:
Atomic, Molecular and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
OSTI ID:
6772289
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 86:2; ISSN JCPSA
Country of Publication:
United States
Language:
English