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Electron attachment to the perfluoroalkanes n-C/sub N/F/sub 2N/+2 (N = 1--6) using high pressure swarm techniques

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:6718614

The electron attachment rate constants and negative ion formation mechanisms for six perfluoroalkanes (n-C/sub N/F/sub 2N/+2(N = 1--6)) have been studied in a high pressure swarm experiment within the mean electron energy range from thermal energy (roughly-equal0.04 eV) to roughly-equal4.9 eV. These experiments were performed over a total gas number density range of 3.2 x 10/sup 19/ to 3.9 x 10/sup 20/ cm/sup -3/ using N/sub 2/ and argon as buffer gases. Dissociative electron attachment was found to be the only negative ion formation process for CF/sub 4/ and C/sub 2/F/sub 6/. For C/sub 3/F/sub 8/, n-C/sub 4/F/sub 10/, and n-C/sub 5/F/sub 12/ the electron attachment rate constant measurements exhibited a large total pressure dependence which was strongest for C/sub 3/F/sub 8/ and decreased with increasing size of the perfluoroalkane molecule. These measurements have been interpreted as electron attachment by parent negative ion formation due to three-body stabilization processes of the initially excited, short-lived (5 x 10/sup -11/ s or =5 eV for CF/sub 4/).

Research Organization:
Atomic, Molecular and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830
DOE Contract Number:
W-7405-ENG-26
OSTI ID:
6718614
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 80:12; ISSN JCPSA
Country of Publication:
United States
Language:
English