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Electron attachment and ionization coefficients and electron drift velocities in BF/sub 3/ and SiF/sub 4/

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.342920· OSTI ID:6532999

The drift velocity of electrons (w) in SiF/sub 4/ and BF/sub 3/ has been measured over the density-reduced electric field (E/N) range 0.5 x 10/sup -17/ V cm/sup 2/ less than or equal toE/Nless than or equal to300 x 10/sup -17/ V cm/sup 2/ using a pulsed Townsend experimental technique. The electron attachment (eta/N) and ionization (..cap alpha../N) coefficients have also been measured in SiF/sub 4/ and BF/sub 3/ over the E/N range 30 x 10/sup -17/ V cm/sup 2/ less than or equal toE/Nless than or equal to300 x 10/sup -17/ V cm/sup 2/ in the same experiment. The electron drift velocities in these two gases exhibit regions of negative differential conductivity (NDC) similar to but smaller in magnitude than those in CH/sub 4/ and CF/sub 4/ . The effective ionization coefficient (alpha-bar/N) has been obtained from the eta/N and ..cap alpha../N measurements in both gases, from which the high-voltage limiting electric field strengths (E/N)/sub lim/ have been found to be 123 x 10/sup -17/ V cm/sup 2/ for BF/sub 3/ and 121 x 10/sup -17/ V cm/sup 2/ for SiF/sub 4/. The significance of these results in modeling gas discharges for a number of technological applications is indicated.

Research Organization:
Atomic, Molecular, and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
OSTI ID:
6532999
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 65:5; ISSN JAPIA
Country of Publication:
United States
Language:
English