Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

``Electric growth`` of metal overlayers on semiconductor substrates

Technical Report ·
DOI:https://doi.org/10.2172/676875· OSTI ID:676875
;  [1]; ;  [2];  [3]
  1. Oak Ridge National Lab., TN (United States). Solid State Div.
  2. Univ. of Texas, Austin, TX (United States). Dept. of Physics
  3. Princeton Univ., NJ (United States)
In this article, the authors present the main results from their recent studies of metal overlayer growth on semiconductor substrates. They show that a variety of novel phenomena can exist in such systems, resulting from several competing interactions. The confined motion of the conduction electrons within the metal overlayer can mediate a surprisingly long-range repulsive force between the metal-semiconductor interface and the growth front, acting to stabilize the overlayer. Electron transfer from the overlayer to the substrate leads to an attractive force between the two interfaces, acting to destabilize the overlayer. Interface-induced Friedel oscillations in electron density can further impose an oscillatory modulation onto the two previous interactions. These three competing factors, of all electronic nature, can make a flat metal overlayer critically, marginally, or magically stable, or totally unstable against roughening. The authors further show that, for many systems, these electronic effects can easily win over the effect of stress. First-principles studies of a few representative systems support the main features of the present electronic growth concept.
Research Organization:
Oak Ridge National Lab., Solids State Div., TN (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
AC05-96OR22464
OSTI ID:
676875
Report Number(s):
ORNL/CP--96643; CONF-9706290--; ON: DE99000355; BR: KC0202030; CNN: Grant NSF MSS-9258115; Grant NSF DMR-9705406
Country of Publication:
United States
Language:
English

Similar Records

{open_quotes}Electronic Growth{close_quotes} of Metallic Overlayers on Semiconductor Substrates
Journal Article · Mon Jun 01 00:00:00 EDT 1998 · Physical Review Letters · OSTI ID:636191

Ion beam mixing of titanium overlayers with hydroxyapaptite substrates
Conference · Sat Dec 31 23:00:00 EST 1994 · OSTI ID:10116057

Quantum stability of ultrathin metal overlayers on semiconductor substrates
Journal Article · Sun Oct 31 23:00:00 EST 2004 · Surface Science · OSTI ID:1000913