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Monte Carlo simulation of ionization in a magnetron plasma

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.576777· OSTI ID:6765363
; ; ;  [1]
  1. Department of Physics and Astronomy, The University of Iowa, Iowa City, IA (USA)
A Monte Carlo simulation of electrons emitted from the cathode of a planar magnetron is tested against experiments that were reported by Wendt, Lieberman, and Meuth (J. Vac. Sci. Technol. A {bold 6}, 1827 (1988)) and by Gu and Lieberman (J. Vac. Sci. Technol. A {bold 6}, 2960 (1988)). Comparing their measurements of the radial profile of current and the axial profile of optical emission to the ionization profiles predicted by the model, we find good agreement for a typical magnetic field strength of 456 G. We also find that at 456 G the product of the average number of ionizations {l angle}{ital N}{sub {ital i}}{r angle} and the secondary electron emission coefficient {gamma} is {similar to}1. This indicates that secondary emission contributes significantly to the ionization that sustains the discharge. At 171 G, however, {l angle}{ital N}{sub {ital i}}{r angle}{gamma}{much lt}1, revealing that cathode emission is inadequate to sustain a discharge at a low magnetic field.
OSTI ID:
6765363
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:3; ISSN 0734-2101; ISSN JVTAD
Country of Publication:
United States
Language:
English

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