A reactive sputtering model applied to AlN

Journal Article · Sun Sep 01 00:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.577202· OSTI ID:5243306

Oefner, H; Zarwasch, R ^[1]; Rille, E ^[2]; Pulker, H K ^[3]

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1. University of Innsbruck, Institut of Experimental Physics, Technikerstrasse 13, A-6020 Innsbruck (Austria)
2. Leica Heerbrugg AG, CH-9435 Heerbrugg (Switzerland)
3. Balzers AG, FL-9496 Balzers (Principality of Liechtenstein)

To the model of reactive sputtering of Berg {ital et} {ital al}. (S. Berg, H.-O. Blom, T. Larsson, C. Nender, J. Vac. Sci. Technol. A {bold 5}, 202 (1987)) an energy dependent sputtering yield was introduced. Calculated hysteresis curves were in good agreement with measurements.

• OSTI ID: 5243306
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 9:5; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

656003* -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ALUMINIUM COMPOUNDS
ALUMINIUM NITRIDES
CATHODE SPUTTERING
ELEMENTS
ENERGY DEPENDENCE
FLUID FLOW
GAS FLOW
HYSTERESIS
METALS
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
SPUTTERING