Method and apparatus for laser/plasma chemical processing of substrates

Patent · Sat Jul 21 00:00:00 EDT 1984

OSTI ID:6759913

Gee, J M; Hargis, Jr, P J

A process for the modification of substrate surfaces is described, wherein etching or deposition at a surface occurs only in the presence of both reactive species and a directed beam of coherent light.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• DOE Contract Number: AC04-76DP00789
• Assignee: Dept. of Energy
• Application Number: ON: DE87007260
• OSTI ID: 6759913
• Resource Relation: Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
SUBSTRATES
SURFACE TREATMENTS
LASER RADIATION
ALUMINIUM
DEPOSITION
EPITAXY
ETCHING
GALLIUM ARSENIDES
IRRADIATION
SILANES
TUNGSTEN
ARSENIC COMPOUNDS
ARSENIDES
ELECTROMAGNETIC RADIATION
ELEMENTS
GALLIUM COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
METALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PNICTIDES
RADIATIONS
SILICON COMPOUNDS
SURFACE FINISHING
TRANSITION ELEMENTS
420800* - Engineering- Electronic Circuits & Devices- (-1989)