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Study of CdTe(111)B epilayers grown by molecular-beam epitaxy

Journal Article · · J. Vac. Sci. Technol., A; (United States)
DOI:https://doi.org/10.1116/1.576097· OSTI ID:6759591

The growth of high-quality Hg/sub 1-//sub x/Cd/sub x/Te(111)B epitaxial layers involves the growth of a CdTe(111)B buffer layer, whether the growth is performed onto related or foreign substrates. CdTe(111)B layers have been investigated using the x-ray double-crystal rocking curve and the cathodoluminescence imaging techniques. The optimization of the growth conditions for CdTe(111)B layers is presented for a high-quality homoepitaxy. The heteroepitaxy of CdTe(111)B on GaAs(100) substrates is then discussed, in the case of GaAs substrates oriented (100), misoriented by 2/sup 0/ towards (110), and misoriented by 5/sup 0/ towards (111). The results indicate that a 2/sup 0/ misorientation leads to CdTe(333) peaks with full width at half-maximum up to four times narrower then either of the other orientations tested. Furthermore, only threading dislocations were visible on this orientation by cathodoluminescence imaging.

Research Organization:
Department of Physics, University of Illinois at Chicago, Chicago, Illinois 60680
OSTI ID:
6759591
Journal Information:
J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:2; ISSN JVTAD
Country of Publication:
United States
Language:
English