Fabrication of an inductor using amorphous films with a multilayered structure
Journal Article
·
· J. Appl. Phys.; (United States)
By making use of the high permeability and the excellent high-frequency characteristics of Co-metal amorphous multilayered films, an inductor was fabricated. In order to improve the high-frequency characteristics, stripe patterned films were studied. The inductor consists of two of these films and a ferrite yoke. The value of inductance and quality factor were measured in the frequency range of 0.01--200 MHz. Although the value of the present inductance is small compared with other small size inductors developed so far, excellent high-frequency characteristics may be expected if an inductor is fabricated composed solely of these multilayered films.
- Research Organization:
- Department of Electrical Engineering, Tohoku Gakuin University, Tagajo 985, Japan
- OSTI ID:
- 6741737
- Journal Information:
- J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 64:10; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360104 -- Metals & Alloys-- Physical Properties
440300* -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
ALLOYS
AMORPHOUS STATE
CARBON ADDITIONS
COBALT COMPOUNDS
FABRICATION
FERRITE
FILMS
FREQUENCY DEPENDENCE
FREQUENCY RANGE
INDUCTION
IRON ALLOYS
KHZ RANGE
KHZ RANGE 100-1000
LAYERS
MAGNETIC CIRCUITS
MAGNETIC PROPERTIES
MAGNETIC SUSCEPTIBILITY
MHZ RANGE
MHZ RANGE 01-100
MHZ RANGE 100-1000
PHYSICAL PROPERTIES
SPUTTERING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
360104 -- Metals & Alloys-- Physical Properties
440300* -- Miscellaneous Instruments-- (-1989)
47 OTHER INSTRUMENTATION
ALLOYS
AMORPHOUS STATE
CARBON ADDITIONS
COBALT COMPOUNDS
FABRICATION
FERRITE
FILMS
FREQUENCY DEPENDENCE
FREQUENCY RANGE
INDUCTION
IRON ALLOYS
KHZ RANGE
KHZ RANGE 100-1000
LAYERS
MAGNETIC CIRCUITS
MAGNETIC PROPERTIES
MAGNETIC SUSCEPTIBILITY
MHZ RANGE
MHZ RANGE 01-100
MHZ RANGE 100-1000
PHYSICAL PROPERTIES
SPUTTERING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS