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Photoemission and glancing-angle EXAFS (X-ray Absorption Fine Structure) studies of vacuum deposited Al/Cu bilayers

Conference ·
OSTI ID:6732841
The effects of oxygen exposure and substrate temperature on the structure and chemical composition of vacuum deposited Al/Cu and Al/O/sub 2//Cu bilayers are studied using photoemission and glancing-angle extended x-ray absorption fine structure (EXAFS) measurements. Use of these complementary techniques permits detailed atomic level characterization of thin film structure nd chemical composition during thin film deposition in vacuum or thin film modification by heat treatment in air. In absence of oxygen contamination, photoemission indicates significant interfacial reaction at room temperature at the Al/Cu interface. Glancing-angle EXAFS shows that an Al-rich Cu-Al alloy forms at the interface at room temperature. Heat treatment promotes alloy formation and CuAl/sub 2/ forms at temperatures from 120 to 150/degree/C. For interface formed after substrate oxygen exposure significant alloying is still observed and Al reduced the Cu-O substrate leading to the formation of Cu-Al and Al/sub 2/O/sub 3/-compounds at room temperatures. Annealing the oxygen exposed interface leads to the formation of a CuAl/sub 2/ phase but at higher temperatures than was observed for sampled produced in ultrahigh vacuum. 20 refs., 5 figs.
Research Organization:
Brookhaven National Lab., Upton, NY (USA)
DOE Contract Number:
AC02-76CH00016; AS05-80ER10742
OSTI ID:
6732841
Report Number(s):
BNL-41731; CONF-881002-13; ON: DE89001271
Country of Publication:
United States
Language:
English