Photoemission and glancing-angle extended x-ray absorption fine-structure studies of vacuum-deposited Al/Cu bilayers

Journal Article · Mon May 01 04:00:00 EDT 1989 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.576090· OSTI ID:6295220

Di Marzio, D; Chen, H; Ruckman, M W; Heald, S M

The effects of oxygen exposure and substrate temperature on the structure and chemical composition of vacuum-deposited Al/Cu and Al/O/sub 2//Cu bilayers are studied using photoemission and glancing-angle extended x-ray absorption fine-structure (EXAFS) measurements. Use of these complementary techniques permits detailed atomic-level characterization of thin-film structure and chemical composition during thin-film deposition in vacuum or thin-film modification by heat treatment in air. In absence of oxygen contamination, photoemission indicates significant interfacial reaction at room temperature at the Al/Cu interface. Glancing-angle EXAFS shows that an Al-rich Cu--Al alloy forms at the interface at room temperature. Heat treatment promotes alloy formation and CuAl/sub 2/ forms at temperatures from 120 to 150 /sup 0/C. For interfaces formed after substrate oxygen exposure significant alloying is still observed and Al reduces the Cu--O substrate leading to the formation of Cu--Al and Al/sub 2/O/sub 3/ compounds at room temperature. Annealing the oxygen exposed interface leads to the formation of a CuAl/sub 2/ phase but at higher temperatures than was observed for samples produced in ultrahigh vacuum.

• Research Organization: Department of Applied Science, Materials Science Division, Brookhaven National Laboratory, Upton, New York 11973
• OSTI ID: 6295220
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 7:3; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
ALUMINIUM
ANNEALING
CHEMICAL COMPOSITION
COPPER
CRYSTAL GROWTH
CRYSTAL STRUCTURE
DATA
DEPOSITION
ELECTRON SPECTROSCOPY
ELEMENTS
EMISSION
EXPERIMENTAL DATA
FILMS
HEAT TREATMENTS
INFORMATION
LAYERS
MEDIUM TEMPERATURE
METALS
NUMERICAL DATA
PHOTOEMISSION
SECONDARY EMISSION
SPECTROSCOPY
THIN FILMS
TRANSITION ELEMENTS