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Hydride precipitation in vapor deposited Ti thin films

Journal Article · · Journal of Materials Research; (United States)
; ;  [1]
  1. Department of Materials Science and Engineering and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
Titanium hydrides having two different crystal structures were observed in [alpha]--Ti thin films grown epitaxially on sapphire substrates by [ital e]-beam physical vapor deposition. One of the hydrides ([gamma]-hydride) had a face-centered tetragonal structure ([ital c]/[ital a][ge]1) with an ordered arrangement of hydrogen atoms. The second hydride formed was the fcc [delta]-hydride. The [gamma]-hydride grew as platelets in the [alpha]--Ti lattice with [l brace]10[bar 1]0[r brace][sub Ti] habit planes, whereas the [delta]-hydrides formed directly on the sapphire substrate parallel to the (0001)[sub Ti]. These hydrides are one of the principal causes of film decohesion.
DOE Contract Number:
FG02-91ER45439
OSTI ID:
6732733
Journal Information:
Journal of Materials Research; (United States), Journal Name: Journal of Materials Research; (United States) Vol. 8:2; ISSN JMREEE; ISSN 0884-2914
Country of Publication:
United States
Language:
English