Mechanistic studies of the CVD of silicon nitride from SiF[sub 4] and NH[sub 3]
Conference
·
OSTI ID:6713166
An industrial process for the CVD of silicon nitride from SiF[sub 4] and NH[sub 3] was studied with a wide variety of techniques, ranging from numerical models of the coupled chemistry and fluid mechanics to experimental studies of chemical reactions. The latter includes a set of molecular beam experiments that probed the temperature and flux dependencies of the reaction of SiF[sub 4] and NH[sub 3] at the surface. These experiments showed that the CVD reactor chemistry was dominated by surface kinetics rather than gas-phase decomposition.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- DOE; DOD; USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6713166
- Report Number(s):
- SAND-92-2441C; CONF-930571--3; ON: DE93004500; CNN: F33615-89-C-5628
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
AMMONIA
BEAMS
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
KINETICS
MOLECULAR BEAMS
NITRIDES
NITROGEN COMPOUNDS
NITROGEN HYDRIDES
PNICTIDES
REACTION KINETICS
SILICON COMPOUNDS
SILICON FLUORIDES
SILICON HALIDES
SILICON NITRIDES
SURFACE COATING
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
AMMONIA
BEAMS
CHEMICAL COATING
CHEMICAL REACTION KINETICS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
HYDRIDES
HYDROGEN COMPOUNDS
KINETICS
MOLECULAR BEAMS
NITRIDES
NITROGEN COMPOUNDS
NITROGEN HYDRIDES
PNICTIDES
REACTION KINETICS
SILICON COMPOUNDS
SILICON FLUORIDES
SILICON HALIDES
SILICON NITRIDES
SURFACE COATING