Mechanistic studies of the CVD of silicon nitride from SiF{sub 4} and NH{sub 3}
Conference
·
OSTI ID:10113549
An industrial process for the CVD of silicon nitride from SiF{sub 4} and NH{sub 3} was studied with a wide variety of techniques, ranging from numerical models of the coupled chemistry and fluid mechanics to experimental studies of chemical reactions. The latter includes a set of molecular beam experiments that probed the temperature and flux dependencies of the reaction of SiF{sub 4} and NH{sub 3} at the surface. These experiments showed that the CVD reactor chemistry was dominated by surface kinetics rather than gas-phase decomposition.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 10113549
- Report Number(s):
- SAND--92-2441C; CONF-930571--3; ON: DE93004500; CNN: Contract F33615-89-C-5628
- Country of Publication:
- United States
- Language:
- English
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