Deposition and characterization of vacuum deposited aluminum films on Kapton laminates

Technical Report · Sat Jul 01 04:00:00 EDT 1978

DOI:https://doi.org/10.2172/6701261· OSTI ID:6701261

Sherman, D M

A process has been developed for the vacuum deposition by electron beam evaporation of high quality aluminum films 10 ..mu..m thick on domed three-layer laminated substrates consisting of Kapton/Pyralux/Kapton/Pyralux/Aluminum (Du Pont Corporation). Thermogravimetric analysis and mass spectrometry of the substrate materials and in-process residual gas analysis were used to determine the outgassing characteristics of the substrate laminate and to aid in the development of suitable thermal processing. The laminated substrates required bakeouts both at atmosphere and in high vacuum prior to deposition to permit evaporation at a pressure of 0.1 mPa (1 x 10/sup -6/ torr). Film properties that were obtained were a thickness uniformity across a 200 mm diameter part in the 1 percent range, a resistivity near that of bulk pure aluminum, a smooth and shiny film surface, and adequate film adhesion.

• Research Organization: Bendix Corp., Kansas City, MO (USA)
• DOE Contract Number: EY-76-C-04-0613
• OSTI ID: 6701261
• Report Number(s): BDX-613-1873(Rev.)
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360401 -- Polymers & Plastics-- Preparation & Fabrication-- (-1987)
ALUMINIUM
COATINGS
DEPOSITION
ELEMENTS
EVAPORATION
FILMS
METALS
PETROCHEMICALS
PETROLEUM PRODUCTS
PHASE TRANSFORMATIONS
PLASTICS
SURFACE COATING
VACUUM COATING
VAPOR DEPOSITED COATINGS