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Valence band discontinuity at the ZnTe/CdTe interface: Making ohmic contact to [ital P]-type CdTe

Conference · · AIP Conference Proceedings (American Institute of Physics); (United States)
OSTI ID:6683914
 [1]; ;  [2]
  1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)
  2. Synchrotron Radiation Center, 3731 Schneider Drive, Stoughton, Wisconsin 53589 (United States)
We studied the growth and electronic structure of the ZnTe/CdTe(100) interface with angle-resolved synchrotron radiation photoemission (ARPES) and reflection high energy electron diffraction (RHEED). RHEED patterns during the growth of ZnTe layers on the CdTe(100) substrate showed that the initial [similar to]16 A grows in registry. After this pseudomorphic 16 A layer, the next 120 A grows with defects to relieve the 6.6% strain between ZnTe and CdTe. After [similar to]140 A, the ZnTe layers are relaxed. ARPES taken near the Brillouin zone center gave a valance band offset [Delta][ital E][sub [ital v]]=0.14 eV, with the ZnTe valence band maximum (VBM) higher than the CdTe VBM.
OSTI ID:
6683914
Report Number(s):
CONF-9205115--
Conference Information:
Journal Name: AIP Conference Proceedings (American Institute of Physics); (United States) Journal Volume: 268:1
Country of Publication:
United States
Language:
English