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Nucleation of misfit dislocations in In[sub 0. 2]Ga[sub 0. 8]As epilayers grown on GaAs substrates

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.114069· OSTI ID:6654349
; ;  [1]; ;  [2]
  1. Materials Science Division, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (United States)
  2. Sandia National Laboratories, Albuquerque, New Mexico 87185-5800 (United States)
Misfit dislocation arrays in In[sub 0.2]Ga[sub 0.8]As epilayers grown on GaAs substrates tilted 2[degree]--10[degree] away from exact (001) toward varied directions have been studied by transmission electron microscopy. A method has been developed to determine the glide plane and the Burgers vector of each misfit dislocation in the tilted InGaAs/GaAs interfaces. Based on experimental observations and theoretical analyses, it is proposed that a stacking fault surrounded by a 30[degree] partial is at first generated by a growth error, followed by thermally activated nucleation of a 90[degree] partial dislocation that removes the stacking fault and forms a 60[degree] dislocation. From the frequency of nucleation events versus the dislocation glide force, the energy barrier for dislocation nucleation of [alpha] and [beta] 90[degree] partial dislocations was determined to be equal to 1.5 and 1.4 eV, respectively.
DOE Contract Number:
AC03-76SF00098; AC04-94AL85000
OSTI ID:
6654349
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 66:4; ISSN 0003-6951; ISSN APPLAB
Country of Publication:
United States
Language:
English