Low-threshold continuous laser operation (300--337 /sup 0/K) of multilayer MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures
Journal Article
·
· Appl. Phys. Lett.; (United States)
Data are presented on multilayer Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures showing that cw 300--337 /sup 0/K laser operation is possible at photoexcitation threshold levels (< or approx. =1.2 x 10/sup 3/ W/cm/sup 2/, J/sub th/< or approx. =500 A/cm/sup 2/) comparable to better LPE double heterojunctions and much lower than all previous single or multiple quantum-well heterostructures. These quantum-well heterostructures are grown by metalorganic chemical vapor deposition (MO-CVD) and consist of four 80--90-A GaAs active layers coupled by three 80--90-A Al/sub x/Ga/sub 1-x/As (xapprox.0.35) barriers, all of which are sandwiched between 1- and 0.3-..mu..m Al/sub x/Ga/sub 1-x/As (xapprox.0.40) confining layers.
- Research Organization:
- Department of Electrical Engineering and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
- OSTI ID:
- 6650037
- Journal Information:
- Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 33:8; ISSN APPLA
- Country of Publication:
- United States
- Language:
- English
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Room-temperature continuous operation of photopumped MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs-Al/sub x/Ga/sub 1-x/As quantum-well lasers
Journal Article
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Sat Apr 14 23:00:00 EST 1979
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6476785
Photopumped laser operation of MO-CVD Al/sub x/Ga/sub 1-x/As near a GaAs quantum well (lambda> or approx. =6200 A, 77 /sup 0/K)
Journal Article
·
Sun Oct 01 00:00:00 EDT 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6729538
Room-temperature continuous operation of photopumped MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs-Al/sub x/Ga/sub 1-x/As quantum-well lasers
Journal Article
·
Sat Jul 01 00:00:00 EDT 1978
· Appl. Phys. Lett.; (United States)
·
OSTI ID:6847187
Related Subjects
42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
EMISSION SPECTRA
ENERGY
ENERGY-LEVEL TRANSITIONS
EXCITATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
JUNCTION DIODES
LASERS
LAYERS
OPERATION
OPTICAL PUMPING
PERFORMANCE
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR LASERS
SPECTRA
SURFACE COATING
THRESHOLD ENERGY
420300* -- Engineering-- Lasers-- (-1989)
ALUMINIUM ARSENIDES
ALUMINIUM COMPOUNDS
ARSENIC COMPOUNDS
ARSENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DEPOSITION
EMISSION SPECTRA
ENERGY
ENERGY-LEVEL TRANSITIONS
EXCITATION
GALLIUM ARSENIDES
GALLIUM COMPOUNDS
JUNCTION DIODES
LASERS
LAYERS
OPERATION
OPTICAL PUMPING
PERFORMANCE
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
SEMICONDUCTOR LASERS
SPECTRA
SURFACE COATING
THRESHOLD ENERGY