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Title: Low-threshold continuous laser operation (300--337 /sup 0/K) of multilayer MO-CVD Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.90522· OSTI ID:6650037

Data are presented on multilayer Al/sub x/Ga/sub 1-x/As-GaAs quantum-well heterostructures showing that cw 300--337 /sup 0/K laser operation is possible at photoexcitation threshold levels (< or approx. =1.2 x 10/sup 3/ W/cm/sup 2/, J/sub th/< or approx. =500 A/cm/sup 2/) comparable to better LPE double heterojunctions and much lower than all previous single or multiple quantum-well heterostructures. These quantum-well heterostructures are grown by metalorganic chemical vapor deposition (MO-CVD) and consist of four 80--90-A GaAs active layers coupled by three 80--90-A Al/sub x/Ga/sub 1-x/As (xapprox.0.35) barriers, all of which are sandwiched between 1- and 0.3-..mu..m Al/sub x/Ga/sub 1-x/As (xapprox.0.40) confining layers.

Research Organization:
Department of Electrical Engineering and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
OSTI ID:
6650037
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 33:8
Country of Publication:
United States
Language:
English