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Optical absorption spectra of surface or interface states in hydrogenated amorphous silicon

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93762· OSTI ID:6649422

The optical absorption of doped and undoped hydrogenated amorphous silicon (a-Si:H) films ranging from 5 nm to 10 ..mu..m was measured using photothermal deflection spectroscopy. The absorption spectra show that there is a high defect layer associated with the surface or interface of the film. From comparison of defect absorption and dangling bond spin densities, it is found that a-Si:H films which have approx.10/sup 15/ bulk defects/cm/sup 3/ exhibit surface or interface layers with approx.10/sup 12/ dangling bonds/cm/sup 2/.

Research Organization:
Xerox Palo Alto Research Center, Palo Alto, California 94304
OSTI ID:
6649422
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 42:1; ISSN APPLA
Country of Publication:
United States
Language:
English