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U.S. Department of Energy
Office of Scientific and Technical Information

Thin film solar cell

Patent ·
OSTI ID:6628010
A thin film solar cell formed on a substrate, comprising at least first and second electrodes, at least one of which is capable of passing light, a silicon film interposed between said first and second electrodes, and at least one junction formed in the silicon film for separating electrons and positive holes when the cell is exposed to light, wherein said silicon film comprises a mixed phase consisting of a polycrystalline phase and an amorphous phase, and includes at least about 50% by volume of fibrous crystalline grains, each of said grains having a maximum bottom diameter of about 1 ..mu..m and a minimum height of about 50 nm and having its grain boundaries terminated with a monovalent element. The solar cell has a high photoelectric conversion efficiency comparable to that of a single-crystal solar cell, and can be produced at a low cost.
Assignee:
Hitachi, Ltd. (Japan)
Patent Number(s):
US 4433202
OSTI ID:
6628010
Country of Publication:
United States
Language:
English